Specifications include, but are not limited to: The University of Wisconsin-Madison, hereinafter referred to as the “University”, through its Purchasing Services Department, hereinafter referred to as “Purchasing”, on behalf of the Department of Physics, hereinafter referred to as “Department”, requests bids for the purchase of an Atomic Layer Deposition System. Scope - This RFP is for an atomic layer deposition (ALD) system that is capable of depositing dielectrics and superconducting thin films that can be used for electrostatic gate barriers, superconducting qubit devices, conformal coatings for surface control, semiconductor device manufacturing, and optical coatings. This tool will operate using several different modalities that allow for a wide range of precursors to be used, and utilize plasma, thermal and ozone enhanced deposition methods.