P1 Corial 210IL ICP-RIE system 1 EA - Each 41100000 - Laboratory and scientific equipment | 5751 <$5k, 8422 Corial 210IL ICP-RIE system with vacuum load-lock for up to 200mm substrates. System uses chlorinated reactive gases and CH4/H2 for III-V (GaN, AlGaN, GaAs, InP) and II-VI compounds (ZnS, CdTe and HgCdTe) etching. Enables etching of hard materials as Al2O3, SiC, LiTaO3 and glasses. Offers automatic multistep process capability when equipped with a CCD camera laser endpoint detector. Must be capable of running both F-based and Cl-based chemistries. Must be capable of etching Si, SiO2, and SiN in additional to metals and III-V materials. P2 Shuttle for 1 X 100 mm wafer (SEMI Standard) 1 EA - Each 41100000 - Laboratory and scientific equipment | 5751 <$5k, 8422 Shuttle for 1 X 100 mm wafer (SEMI Standard) P3 Shuttle for 1 X 150 mm wafer (SEMI Standard) 1 EA - Each 41100000 - Laboratory and scientific equipment | 5751 <$5k, 8422 Shuttle for 1 X 150 mm wafer (SEMI Standard) P4 Shuttle for 1 X 200 mm wafer (SEMI Standard) 1 EA - Each 41100000 - Laboratory and scientific equipment | 5751 <$5k, 8422 Shuttle for 1 X 200 mm wafer (SEMI Standard) P5 Additional year of warranty totaling 2 years 1 EA - Each 81101706 - Laboratory equipment maintenance | 5512 Additional year of warranty totaling 2 years P6 Shipping - DDP or FOB Destination Freight Prepaid and Allowed to College Station, TX (please specify 1 EA - Each Shipping costs must be included in the prices listed above or here as a line item. If shipping charges are not included in your bid, they will not be paid. Shipping must include all applicable tariffs, customs, duties and fees if there are any. If quoting a tariff, please leave a note on tariff rate/price and HTS code.
