MLA 150 System 45101504 - Lithographic equipment | 5752 <$5k, 8424 MLA 150 System 1um resolution, ~ 1100 mm2/min maximum speed, 405nm laser module. Equipped with dual laser modules (365nm and 405nm) and backside alignment function Environmental chamber providing stable environment for the system: - laminar airflow (adjustable): 0.3 - 0.5 m/s - regulation to ambient temperature (18-24℃) - temperature stability: ± 0.1 C (at ±1 ℃ ambient temperature) - air quality: ISO 4. Overview camera with a field of view of 13 x 9 mm2 for fast and easy alignment. Stage system with linear motors and universal vacuum chuck (AVC0O): - maximum substrate size: 9" x 9" - minimum substrate size: 5 x 5 mm2 - maximum exposure area: 150 x 150 mm2 - substrate thickness: 0.1 to 12 mm - stage resolution: 10 nm. Diode Laser Illumination Module (405 nm) 45101504 - Lithographic equipment | 5752 <$5k, 8424 Diode Laser Illumination Module (405 nm) - laser wavelength: 405 nm - output power: 8 W - typical emission lifetime of 10.000 hrs. UV Diode Laser Illumination Module (375 nm) 45101504 - Lithographic equipment | 5752 <$5k, 8424 UV Diode Laser Ilumination Module (375 nm) - laser wavelength: 375 nm - output power: 2.8 W Write Mode II - minimum feature size of 1 um 45101504 - Lithographic equipment | 5752 <$5k, 8424 Write Mode II - minimum feature size of 1 pm Optical Autofocus 45101504 - Lithographic equipment | 5752 <$5k, 8424 Optical Autofocus Backside Alignment 45101504 - Lithographic equipment | 5752 <$5k, 8424 Backside Alignment
