• Standalone enclosure for vibration and environmental isolation of stage, camera and nanoindentor head. System shall also contain a passive isolation platform such as a granite block. • Nanoindentor head must be able to apply greater than or equal to 10 mN of force over a displacement of 5 µm with a maximum loading rate greater than or equal to 50 mN/s with the system ideally employing electrostatic actuation for nanomechanical testing. • Nanoindentor head must also be able to perform nanoscratch including lateral load measurements. The system and analysis software shall provide analysis and determination of the critical load of adhesion. • Thermal drift of nanoindentor head must be less than or equal to 0.05 nm/sec. • The force actuation/displacement sensing must be combined in a single transducer assembly to eliminate sources of measurement error and variability; such as cosine and Abbe offset errors associated with separate displacement sensing mechanisms. • Separate or same Nanoindentor head as above with a modulation frequency range of 0.1 Hz to 300 Hz in the normal direction for measuring creep, nano-Dynamic Mechanical Analysis and relaxation. • System shall have load noise floor less than or equal to 75 nN. • All transducers shall be able to operate under both load or displacement feedback control using any user-defined load functions. • High precision, fully automated and programmable motorized translational stages for sample movement. • System must be able to accommodate at least a 4” Si wafer. • System must be able to handle sample weights greater than or equal to 5 kg. • Flexible sample mounting, with an optional vacuum-based mounting for flat samples being ideal. • High speed mechanical property mapping of at a rate of least greater than or equal to 1 indent/second, with selectable force or displacement control cutoffs. High speed mechanical property mapping shall be compatible with heating cooling, fluid and electrochemical stages specified below. • System must be compatible with liquid/fluid samples and soft/biological samples. • System must have in-situ SPM imaging with probe scanning as opposed to sample scanning, with nm scale resolution for topography of pre- and post-test scanning of samples surfaces, and SPM imaging must be done with the same probe that is used to conduct the nanomechanical testing • SPM imaging maximum scan size should cover an area of greater than or equal to 60 µm x 60 µm and be compatible with all optional stages such as heating and cooling. • Optical imaging system with at least a 10X objective fiber optic light source and high-resolution color CCD camera for high quality color images of the sample surface. • An emergency stop option that electronically interlocks the nanoindentation head to the stage controller must be included to reduce the risk of accidental head crashes. • System must be upgradable to add future options such as a heating stage greater than or equal to 400°C, cooling stage less than or equal to -120°C, electrochemical nanoindentation, and high force transducer head greater than or equal to 5 N. • The entire Nanoindentor system must be fully supported for a guaranteed minimum of seven (7) years for both technical and spare parts support after installation is completed at Louisiana Tech University. • The system must include all manuals and the manufacturer offers telephone, e-mail and remote system support during the normal work hours of Louisiana Tech University. • The nanoindentor system will come with a one (1) year warranty
