Specifications include, but are not limited to: 1-Growth system must be a single-chamber design and employ the microwave-plasma assisted chemical vapor deposition (MPCVD) growth technique. Vendors proposing systems that use other techniques such as hot-filament growth will be considered non-responsive. 2 - Growth system must have all necessary internal and external electrical wiring and connections and must have an associated microwave power supply to drive the plasma chamber. The microwave supply must be capable of delivering at least 2.5 kW of microwave energy. 3 - Growth system must have a water-cooled stage for placement of sample or substrate. The height of this stage inside the reactor must be adjustable over a continuous range. This stage must be made of materials that support operation up to 1200 degrees centigrade in a hydrogen environment. The sample stage diameter must be at least 60 mm in diameter. 4 -Growth system must operate on 3-phase 60 Hz power of either 208 V or 460 V. 5 - Growth system must have all necessary computer controls and software for recipe driven process control, safety monitoring, operation monitoring, fault indication, and data logging. The said software, and associated help menus and manuals, will all be provided in English. Reactor safety and control functions to be controlled by dedicated PLC. If a desktop computer is used for operation, it should not be responsible for any critical or safety-related functions.