The purpose of this Request for Proposal (“RFP”) is to invite qualified Bidders to prepare and submit proposals to furnish Physical Vapor Deposition (PVD) system for the Synthesis of ferroelectric and multiferroic oxides to the University of California, Berkeley (“UC Berkeley” or “UC”), in accordance with the requirements set forth in this RFP. The overall objective of this RFP is to select a primary Supplier to assist UC in establishing a strategic partnership to provide the goods and/or services described herein. As part of the DARPA-NGMM program, UCB, in partnership with UTA, has to deliver the knowledge base for the sputtering of epitaxial ferroelectric and multiferroic oxides on a 200mm (8inch) substrate platform. The ferroelectric oxides are: BFO, PZT and derivatives of them. Key for epitaxy is to be able to go to high temperature (a max of 800C) for the deposition of the layers. Since the stack will have both metals and insulators, the PVD system needs to have both RF and DC sputtering capability. The system will also need to have the ability to coat 200mm wafers with a uniformity of at least 2-5% across the wafer.
