Specifications include, but are not limited to: The setup must consist of following specifications Two 4 arm glove boxes built in a powder coated frame, and the two boxes must be connected through a T-type transfer chamber. One of the boxes must contain a customized spin-coater well equipped with a spin coater and a robust glass/transparent lid. The equipment must be programmable with multiple steps of spinning and must be capable of a wide range of rotational speeds (0 to 5000 rpm) and acceleration/deceleration times (0.1 s to 20 s increments). The spincoater must be able to allow the modifications in future such as appending an automated robotic dispensing system if required. The other box must be integrated with/integrateable to directly mount the deposition system (see specifications below). The gas management and drying system must be compatible with N2, Ar gases and with a capability of maintaining low levels of moisture (< 0.5 ppm) and O2 (<0.01 ppm) with measurement limits that exceed this need. The pressure in these boxes must be automated and controlled by an automatic purge valves and a dry vacuum pump (TriScroll Teflon diaphragm ~9cfm pump, with a pumping speed of at least 200 L/min, and ultimate vacuum of 10 millitorr). The pump must be able sustain all solvents including DMSO, DMF and halogenated solvents such as CHCL3, DCM and chlorobenzene The deposition system must be attached to the glove box (described above) and allow the access from inside and outside the glove box to the interior of the system. The system must contain 6 thermal deposition sources and 4 sensors. Both sensors and source must be shielded to avoid cross contamination between the materials. The system must support the deposition of very thin ~1 nm to thick ~500 nm with highest precision. A wide range of materials from organics to metals will be explored for the deposition, therefore, the system must be capable to handle metals and organics etc. To pump down the chamber, it must have a high-speed Turbo Vacuum with speed at least 300 I/S and ultimate base pressure to ~10-7 Torr. The system must allow co-deposition process and be controlled by a user-friendly software controlled by a PC. The requirement of this deposition software is that all aspects of machine control, deposition control, and optical control must be highly automated and controlled by a unified recipe. All the PVD controllers must be manageable by a dedicated and included PC.